CVD Equipment Corporation (NASDAQ:CVV – Get Free Report) was the recipient of a significant increase in short interest during the month of March. As of March 13th, there was short interest totaling 25,201 shares, an increase of 42.0% from the February 26th total of 17,744 shares. Approximately 0.5% of the shares of the stock are short sold. Based on an average daily trading volume, of 61,925 shares, the days-to-cover ratio is presently 0.4 days.
Wall Street Analysts Forecast Growth
CVV has been the subject of a number of recent research reports. Weiss Ratings reiterated a “sell (e+)” rating on shares of CVD Equipment in a research report on Wednesday, January 21st. Wall Street Zen raised CVD Equipment to a “hold” rating in a research report on Saturday, March 21st. One investment analyst has rated the stock with a Sell rating, Based on data from MarketBeat.com, CVD Equipment currently has an average rating of “Sell”.
Check Out Our Latest Report on CVD Equipment
CVD Equipment Trading Down 5.3%
Institutional Inflows and Outflows
Large investors have recently added to or reduced their stakes in the stock. Dimensional Fund Advisors LP lifted its position in CVD Equipment by 5.2% in the 3rd quarter. Dimensional Fund Advisors LP now owns 71,689 shares of the industrial products company’s stock worth $241,000 after buying an additional 3,556 shares in the last quarter. Citadel Advisors LLC grew its holdings in shares of CVD Equipment by 93.6% during the 3rd quarter. Citadel Advisors LLC now owns 41,382 shares of the industrial products company’s stock valued at $139,000 after acquiring an additional 20,011 shares in the last quarter. Finally, DRW Securities LLC acquired a new position in shares of CVD Equipment in the fourth quarter worth $45,000. Institutional investors and hedge funds own 31.59% of the company’s stock.
CVD Equipment Company Profile
CVD Equipment Corporation (NASDAQ: CVV) designs, manufactures and markets custom vacuum deposition systems used to create thin-film coatings and advanced materials for semiconductor, optoelectronic and related industries. Established in 1992 and headquartered in the United States, the company leverages proprietary chemical vapor deposition (CVD), plasma-enhanced CVD, metal-organic CVD (MOCVD), atomic layer deposition (ALD) and physical vapor deposition (PVD) technologies to support both research and production applications.
The company’s product portfolio includes single- and multi-chamber reactors for the deposition of silicon, III-V compounds, metal oxides and other specialty materials, along with fluid-bed reactors for nanoparticle synthesis.
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