CVD Equipment (NASDAQ:CVV) Posts Quarterly Earnings Results

CVD Equipment (NASDAQ:CVV) posted its earnings results on Wednesday. The industrial products company reported ($0.20) earnings per share (EPS) for the quarter, Zacks reports. CVD Equipment had a negative net margin of 18.68% and a negative return on equity of 14.18%.

CVD Equipment Price Performance

CVV stock traded down $0.62 during mid-day trading on Wednesday, reaching $7.20. 326,682 shares of the company’s stock were exchanged, compared to its average volume of 189,096. CVD Equipment has a 12-month low of $2.76 and a 12-month high of $9.10. The stock’s 50 day moving average is $7.19 and its 200 day moving average is $5.72. The company has a market cap of $49.97 million, a price-to-earnings ratio of -14.12 and a beta of 1.25.

Institutional Inflows and Outflows

Large investors have recently made changes to their positions in the business. DRW Securities LLC acquired a new stake in CVD Equipment in the 4th quarter valued at $45,000. Citadel Advisors LLC increased its holdings in CVD Equipment by 93.6% in the 3rd quarter. Citadel Advisors LLC now owns 41,382 shares of the industrial products company’s stock worth $139,000 after acquiring an additional 20,011 shares in the last quarter. Finally, Dimensional Fund Advisors LP raised its position in CVD Equipment by 5.2% during the third quarter. Dimensional Fund Advisors LP now owns 71,689 shares of the industrial products company’s stock worth $241,000 after acquiring an additional 3,556 shares during the period. 31.59% of the stock is owned by institutional investors and hedge funds.

Analyst Upgrades and Downgrades

Separately, Weiss Ratings restated a “sell (d-)” rating on shares of CVD Equipment in a research report on Friday, June 5th. One research analyst has rated the stock with a Sell rating, Based on data from MarketBeat.com, CVD Equipment has an average rating of “Sell”.

About CVD Equipment

CVD Equipment Corporation (NASDAQ: CVV) designs, manufactures and markets custom vacuum deposition systems used to create thin-film coatings and advanced materials for semiconductor, optoelectronic and related industries. Established in 1992 and headquartered in the United States, the company leverages proprietary chemical vapor deposition (CVD), plasma-enhanced CVD, metal-organic CVD (MOCVD), atomic layer deposition (ALD) and physical vapor deposition (PVD) technologies to support both research and production applications.

The company’s product portfolio includes single- and multi-chamber reactors for the deposition of silicon, III-V compounds, metal oxides and other specialty materials, along with fluid-bed reactors for nanoparticle synthesis.